Fuqun Grace Vasiknanonte

Title: Fuqun Grace Vasiknanonte: Innovator in Reflectivity and Cobalt Film Technologies

Introduction

Fuqun Grace Vasiknanonte is a notable inventor based in Sunnyvale, CA (US). He has made significant contributions to the field of materials science, particularly in the development of methods for enhancing the reflectivity of aluminum layers and the deposition of cobalt films.

Latest Patents

Vasiknanonte holds 2 patents that showcase his innovative approaches. His latest patents include "Methods and apparatus for high reflectivity aluminum layers," which details a method of depositing an aluminum layer on a substrate. This method involves the use of cobalt or titanium alloys and a chemical vapor deposition (CVD) process. The process includes pre-treating the cobalt layer with a thermal hydrogen anneal at approximately 400 degrees Celsius to ensure optimal performance. Additionally, he has developed a patent focused on "Deposition of cobalt films with high deposition rate," which outlines techniques for processing substrates with spaced oxide layers.

Career Highlights

Vasiknanonte's career is marked by his work at Applied Materials, Inc., where he has been instrumental in advancing technologies related to semiconductor manufacturing. His expertise in chemical vapor deposition processes has positioned him as a key player in the industry.

Collaborations

Throughout his career, Vasiknanonte has collaborated with talented individuals such as Jacqueline S. Wrench and Paul F. Ma. These collaborations have fostered an environment of innovation and have contributed to the success of various projects.

Conclusion

Fuqun Grace Vasiknanonte is a distinguished inventor whose work in reflectivity and cobalt film technologies has made a significant impact in the field. His patents and contributions continue to influence advancements in materials science and semiconductor manufacturing.