Zuopeng He

Title: Zuopeng He: Innovator in Semiconductor Technology

Introduction

Zuopeng He is a prominent inventor based in Shanghai, China, known for his significant contributions to semiconductor technology. With a total of five patents to his name, he has made remarkable advancements in the field, particularly in the areas of semiconductor structures and interconnect designs.

Latest Patents

Zuopeng He's latest patents include a semiconductor structure and a method for forming the same. This innovative method involves providing a base and a pattern transfer material layer above it. The process includes first ion implantation to dope first ions into the pattern transfer material layer, forming first doped mask layers. It also entails creating first trenches in the pattern transfer material layer, forming mask spacers, and performing second ion implantation to create second doped mask layers. The method ultimately enhances the accuracy of pattern transfer. Another notable patent is for an interconnect structure that features metal layers enclosing a dielectric. This structure includes a substrate, a first dielectric layer with an opening for a first interconnect layer, and a second dielectric layer that exposes a portion of the first metal layer, forming a lower portion of the second interconnect layer.

Career Highlights

Zuopeng He has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Ningbo Semiconductor International Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking innovations in semiconductor technology.

Collaborations

Zuopeng He has collaborated with notable professionals in his field, including Ji Guang Zhu and Jingxiu Ding. These collaborations have further enriched his work and have led to advancements in semiconductor research and development.

Conclusion

Zuopeng He is a distinguished inventor whose work in semiconductor technology has made a significant impact. His innovative patents and collaborations highlight his expertise and dedication to advancing the field.