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For the Inventor, By the Inventor

West Linn, OR, United States of America

Zhiyuan Fang

This inventor holds 10 USPTO granted patents and 3 published patent applications. Top assignees: Novellus Systems Incorporated, Lam Research Corporation. Active years: 2008-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Zhiyuan Fang. Retrieved from https://idiyas.com/inventor/zhiyuan-fang

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 10 

% Patents Active = 20.0

Average Co-Inventor Count = 4.0

ph-index = 8

Forward Citations = 1,335(Granted Patents)


Company Filing History:

goldMedal9 out of 993 
 
Novellus Systems Incorporated
 patents
silverMedal1 out of 3,955 
 
Lam Research Corporation
 patents

Years Active: 2008-2026

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10 patents (USPTO):Explore Patents
1. 12680159 - Chamber-accumulation extension via in-situ passivation (2026-07-14),
2. 9240320 - Methods of depositing smooth and conformal ashable hard mask films (2016-01-19),
3. 8669181 - Diffusion barrier and etch stop films (2014-03-11),
4. 8591659 - Plasma clean method for deposition chamber (2013-11-26),
5. 8435608 - Methods of depositing smooth and conformal ashable hard mask films (2013-05-07),
6. 8110493 - Pulsed PECVD method for modulating hydrogen content in hard mask (2012-02-07),
7. 7981810 - Methods of depositing highly selective transparent ashable hardmask films (2011-07-19),
8. 7981777 - Methods of depositing stable and hermetic ashable hardmask films (2011-07-19),
9. 7915166 - Diffusion barrier and etch stop films (2011-03-29),
10. 7381644 - Pulsed PECVD method for modulating hydrogen content in hard mask (2008-06-03),

Title: Zhiyuan Fang: Innovator in Semiconductor Technology

Introduction

Zhiyuan Fang is a prominent inventor based in West Linn, Oregon, known for his significant contributions to semiconductor technology. With a total of 10 patents to his name, Fang has made remarkable advancements in the field of plasma enhanced chemical vapor deposition.

Latest Patents

Fang's latest patents include innovative methods for depositing smooth and conformal ashable hard mask films. These methods utilize precursors with high carbon to hydrogen ratios, such as acetylene, and employ plasmas with low ion energies and fluxes. The techniques are designed to enhance the quality of ashable hard mask films, ensuring good selectivity and improved side wall coverage. Additionally, he has developed diffusion barrier and etch stop films that provide high hermeticity and low dielectric constants, crucial for protecting underlying layers during integrated circuit fabrication.

Career Highlights

Zhiyuan Fang is currently associated with Novellus Systems Incorporated, a company renowned for its cutting-edge semiconductor manufacturing technologies. His work has been instrumental in advancing the capabilities of deposition methods used in the industry.

Collaborations

Fang has collaborated with notable colleagues, including Pramod Subramonium and Jon Henri, contributing to various projects that push the boundaries of semiconductor technology.

Conclusion

Zhiyuan Fang's innovative work in the field of semiconductor technology continues to impact the industry significantly. His patents reflect a commitment to enhancing manufacturing processes and improving material properties.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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