Company Filing History:
Years Active: 2006-2018
Title: Zhiyong Wang: Innovator in Semiconductor Technology
Introduction
Zhiyong Wang is a prominent inventor based in Chandler, AZ, known for his significant contributions to semiconductor technology. With a total of 12 patents to his name, he has made remarkable advancements in the field, particularly in non-destructive imaging techniques.
Latest Patents
One of his latest patents focuses on non-destructive 3-dimensional chemical imaging of photo-resist material. This invention includes devices, systems, and processes that utilize a combined confocal Raman microscope to inspect photo resist film material layers. The technology aims to detect border defects between light-exposed and unexposed regions of the resist film material. By combining Raman spectroscopy and confocal imaging, this method allows for fast, high-resolution, non-destructive in-line inspection, enhancing the technical development of polymerization profiles of the resist film material. Another notable patent describes an apparatus and method to monitor die edge defects. This apparatus comprises an input pad, an output pad, and a wire positioned at the periphery of a semiconductor die, extending along its perimeter. The inclusion of diodes at various sections of the wire allows for effective monitoring of die edge defects.
Career Highlights
Zhiyong Wang is currently employed at Intel Corporation, where he continues to innovate and develop cutting-edge technologies in semiconductor manufacturing. His work has significantly impacted the efficiency and effectiveness of semiconductor processes.
Collaborations
Throughout his career, Wang has collaborated with notable colleagues, including Nilanjan Z Ghosh and Deepak Goyal, contributing to various projects and advancements in the field.
Conclusion
Zhiyong Wang's contributions to semiconductor technology through his innovative patents and work at Intel Corporation highlight his role as a leading inventor in the industry. His advancements in non-destructive imaging and monitoring techniques continue to shape the future of semiconductor manufacturing.