Zhihao Pan

Title: Zhihao Pan: Innovator in Semiconductor Technology

Introduction

Zhihao Pan is a prominent inventor based in Hamburg, Germany. He has made significant contributions to the field of semiconductor technology, holding a total of five patents. His work focuses on innovative methods and devices that enhance the performance and efficiency of semiconductor components.

Latest Patents

Zhihao Pan's latest patents include a multi-trench semiconductor device and a method of manufacture thereof. This semiconductor device features a semiconductor substrate and a semiconductor layer, incorporating at least one shallow trench and at least one deep trench. Each trench extends from the first major surface of the semiconductor layer, with sidewall regions and base regions comprising a doped trench region. The trenches are partially filled with a conductive material that contacts the doped region. Additionally, he has developed a semiconductor device that includes a chip-scale package (CSP) with a plurality of contacts on the substrate's major surface. This device is designed to conduct current through the substrate via an electrically floating metal layer on the backside.

Career Highlights

Throughout his career, Zhihao Pan has worked with notable companies such as Nexperia B.V. and NXP B.V. His experience in these organizations has allowed him to refine his expertise in semiconductor technology and contribute to various innovative projects.

Collaborations

Zhihao has collaborated with esteemed colleagues, including Steffen Holland and Jochen Wynants. Their teamwork has fostered an environment of innovation and creativity in the semiconductor field.

Conclusion

Zhihao Pan's contributions to semiconductor technology through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in semiconductor devices and methods.