Sunnyvale, CA, United States of America

Zheng Ju

USPTO Granted Patents = 1 

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2024

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1 patent (USPTO):Explore Patents

Title: Zheng Ju - Innovator in Physical Vapor Deposition Technology

Introduction

Zheng Ju is a notable inventor based in Sunnyvale, CA, who has made significant contributions to the field of physical vapor deposition (PVD) technology. With a focus on enhancing substrate processing methods, his work has implications for various applications in semiconductor manufacturing.

Latest Patents

Zheng Ju holds a patent titled "Electromagnet pulsing effect on PVD step coverage." This patent describes methods and apparatus for processing a substrate within a physical vapor deposition processing chamber. The invention includes a chamber body that defines a processing volume, a substrate support configured to hold a substrate, and a power supply that energizes a target for sputtering material toward the substrate. An electromagnet is operably coupled to the chamber body, forming electromagnetic field lines through a sheath above the substrate during sputtering. This setup directs sputtered material toward the substrate, while a controller manages the electromagnet based on a pulsing schedule to control the directionality of ions relative to features on the substrate.

Career Highlights

Zheng Ju is currently employed at Applied Materials, Inc., a leading company in the semiconductor equipment industry. His innovative work in PVD technology has positioned him as a key contributor to advancements in substrate processing techniques.

Collaborations

Throughout his career, Zheng has collaborated with talented professionals, including Kevin Kashefi and Xiaodong Wang. These collaborations have fostered a productive environment for innovation and development in their respective fields.

Conclusion

Zheng Ju's contributions to PVD technology through his patent and work at Applied Materials, Inc. highlight his role as an influential inventor in the semiconductor industry. His innovative approaches continue to shape the future of substrate processing methods.

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