Company Filing History:
Years Active: 2009-2010
Title: Innovations by Zamir Abraham
Introduction
Zamir Abraham is a notable inventor based in Rehovot, Israel. He has made significant contributions to the field of technology, particularly in the area of charged particle responsive resist. With a total of 2 patents, his work has advanced the methods and systems used in evaluating and processing measurement targets.
Latest Patents
Zamir Abraham's latest patents include a "System, method and computer software product for inspecting charged particle responsive resist." This invention outlines a system software product and a method for evaluating a mask. The method involves defining multiple critical dimension (CD) measurement target windows and pattern recognition windows, ensuring that they do not overlap. It also includes performing multiple critical dimension measurements of various patterns of an object being manufactured by exposing the mask to radiation.
Another significant patent is the "Process monitoring system and method for processing a large number of sub-micron measurement targets." This invention provides a method that includes receiving design information representative of a portion of an object with sub-micron measurement targets. It processes this information to create a large number of measurement targets and associates target measurement parameters to each of them.
Career Highlights
Zamir Abraham is currently employed at Applied Materials Israel Limited, where he continues to innovate and contribute to advancements in technology. His work focuses on enhancing the efficiency and accuracy of measurement systems in manufacturing processes.
Collaborations
Zamir has collaborated with notable coworkers, including Youval Nehmadi and Gil Sod-Moriah, who have contributed to his projects and innovations.
Conclusion
Zamir Abraham's contributions to technology through his patents and work at Applied Materials Israel Limited highlight his role as an influential inventor. His innovative methods and systems continue to shape the future of measurement technologies.
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