The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 08, 2009
Filed:
Apr. 01, 2004
Process monitoring system and method for processing a large number of sub-micron measurement targets
Youval Nehmadi, Moddin, IL;
Zamir Abraham, Rehovot, IL;
Gil Sod-moriah, Rehovot, IL;
Yair Eran, Rehovot, IL;
Chen Ofek, Wizman, IL;
Yaron Cohen, Givhat-Brener, IL;
Ariel Ben-porath, Gealya, IL;
Youval Nehmadi, Moddin, IL;
Zamir Abraham, Rehovot, IL;
Gil Sod-Moriah, Rehovot, IL;
Yair Eran, Rehovot, IL;
Chen Ofek, Wizman, IL;
Yaron Cohen, Givhat-Brener, IL;
Ariel Ben-Porath, Gealya, IL;
Applied Materials, Israel, Ltd., Rehovot, IL;
Abstract
The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets. The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.