This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials Israel Limited. Active years: 2009-2016.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Givhat-Brener, IL (2009)
- Givat Brener, IL (2013 - 2016)
Company Filing History:
Years Active: 2009-2016
Title: Yaron Cohen: Innovator in Material Analysis and Lithography
Introduction
Yaron Cohen is a notable inventor based in Givat Brener, Israel. He has made significant contributions to the fields of material analysis and lithography, holding a total of 3 patents. His innovative work focuses on enhancing inspection systems and methods for analyzing microscopic elements.
Latest Patents
Cohen's latest patents include a system for detecting weak points in a mask. This inspection system involves a computer program that stores instructions for obtaining an aerial image of a mask area. The aerial image represents an expected image formed on a photoresist during a lithography process. The process allows for allowable changes at pixels of the expected image that do not exceed an intensity threshold. The system searches for weak points in the mask area, identifying local extremum points or crossing points of the printability threshold.
Another significant patent is a system and method for material analysis of a microscopic element. This method illuminates an area of the microscopic element with a charged particle beam. It detects particles generated in response to the beam and analyzes them to provide material characteristics. The method includes a sequence of displacement compensation determination periods to ensure accurate analysis.
Career Highlights
Yaron Cohen works at Applied Materials Israel Limited, where he applies his expertise in material analysis and lithography. His innovative approaches have contributed to advancements in the industry, enhancing the capabilities of inspection systems and material characterization.
Collaborations
Cohen collaborates with talented individuals such as Dmitry Shur and Youval Nehmadi. Their combined efforts foster a creative environment that drives innovation and technological advancements.
Conclusion
Yaron Cohen's contributions to the fields of material analysis and lithography demonstrate his commitment to innovation. His patents reflect a deep understanding of complex processes and a drive to improve existing technologies.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile