Applied Materials Israel Limited

Zamir Abraham

Youval Nehmadi

Ovadya Menadeva

Yair Eran

Ariel Ben-Porath

Yaron Cohen

Sergey Latinsky

Chen Ofek

Orit Afek

Gil Sod-Moriah

A system software product and a method for evaluating a mask, the method including the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the multiple pattern recognition windows, wherein each CD measurement target window and an associated pattern recognition window are positioned within a measurement area that is scannable without introducing a substantial mechanical movement; performing multiple critical dimension measurements of multiple patterns of an object being manufactured by exposing the mask to radiation, wherein the performing comprises using at least one CD measurement target window and at least one pattern recognition window; and evaluating the mask.

System, method and computer software product for inspecting charged particle responsive resist

The invention provides a method that includes the stages of: (i) receiving design information representative of a portion of an object that includes sub micron measurement targets, (ii) processing the received design information to provide a large number of measurement targets; and (iii) associating target measurement parameters to each of large number of measurement targets. The invention provides a system that includes: (i) an interface for receiving design information representative of a portion of a layer of an object that includes sub micron measurement targets; and (ii) a processor, coupled to the interface, for processing the received design information to provide a large number of measurement targets; and for associating target measurement parameters to each of large number of measurement targets.

Process monitoring system and method for processing a large number of sub-micron measurement targets

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Rehovot, Israel

Zamir Abraham