The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 2010
Filed:
Feb. 23, 2006
Youval Nehmadi, Modiin, IL;
Ovadya Menadeva, Modiin, IL;
Sergey Latinsky, Modiin, IL;
Zamir Abraham, Rehovot, IL;
Orit Afek, Ness-Ziona, IL;
Youval Nehmadi, Modiin, IL;
Ovadya Menadeva, Modiin, IL;
Sergey Latinsky, Modiin, IL;
Zamir Abraham, Rehovot, IL;
Orit Afek, Ness-Ziona, IL;
Applied Materials Israel, Ltd., Rehovot, IL;
Abstract
A system software product and a method for evaluating a mask, the method including the stages of: defining multiple CD measurement target windows; defining multiple pattern recognition windows such that the multiple CD measurements windows do not overlap the multiple pattern recognition windows, wherein each CD measurement target window and an associated pattern recognition window are positioned within a measurement area that is scannable without introducing a substantial mechanical movement; performing multiple critical dimension measurements of multiple patterns of an object being manufactured by exposing the mask to radiation, wherein the performing comprises using at least one CD measurement target window and at least one pattern recognition window; and evaluating the mask.