Tokyo, Japan

Yusuke Ohsawa


Average Co-Inventor Count = 2.9

ph-index = 2

Forward Citations = 5(Granted Patents)


Location History:

  • Tokyo, JP (2011 - 2012)
  • Amagasaki, JP (2013)
  • Albany, NY (US) (2014)

Company Filing History:


Years Active: 2011-2014

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4 patents (USPTO):Explore Patents

Title: Yusuke Ohsawa: Innovator in Semiconductor Technology

Introduction

Yusuke Ohsawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His innovative work focuses on advanced etching and film-forming methods that are crucial for the development of modern electronic devices.

Latest Patents

Ohsawa's latest patents include a dry metal etching method that describes a process for etching an aluminum-containing layer on a substrate. This method involves forming plasma from a process composition containing a halogen element and exposing the substrate to the plasma to achieve the desired etching. Additionally, the method may include exposing the substrate to an oxygen-containing environment to oxidize the surface of the aluminum layer, thereby controlling the etch rate. Another notable patent is related to a film-forming method for silicon oxide films, which involves supplying a silicon compound gas, an oxidizing gas, and a rare gas into a plasma processing apparatus. This innovative approach allows for the formation of high-quality silicon oxide films on target substrates.

Career Highlights

Yusuke Ohsawa is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing industry. His work at the company has positioned him as a key player in advancing semiconductor technologies. Ohsawa's expertise in plasma processing and etching methods has contributed to the development of more efficient manufacturing processes for semiconductor devices.

Collaborations

Throughout his career, Ohsawa has collaborated with notable colleagues, including Ryuichi Asako and Hirokazu Ueda. These collaborations have fostered an environment of innovation and have led to the successful development of various technologies in the semiconductor field.

Conclusion

Yusuke Ohsawa's contributions to semiconductor technology through his patents and work at Tokyo Electron Limited highlight his role as an influential inventor. His innovative methods continue to shape the future of electronic device manufacturing.

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