IDiyas

For the Inventor, By the Inventor

Koshi, Japan

Yusaku Hashimoto

USPTO Granted Patents = 12 

Average Co-Inventor Count = 3.3

ph-index = 1

Forward Citations = 2(Granted Patents)


Location History:

  • Kumamoto, JP (2018 - 2019)
  • Koshi, JP (2019 - 2024)

Company Filing History:

goldMedal12 out of 10,295 
 
Tokyo Electron Limited
 patents

Years Active: 2018-2025

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12 patents (USPTO):Explore Patents
1. 12404587 - Substrate processing apparatus and substrate processing method (2025-09-02),
2. 12240012 - Coating film forming method, coating film forming apparatus, and storage medium (2025-03-04),
3. 12216406 - Coating method and coating apparatus (2025-02-04),
4. 11938511 - Coating method, coating apparatus and recording medium (2024-03-26),
5. 11774854 - Substrate processing method, storage medium, and substrate processing apparatus (2023-10-03),
6. 11480881 - Substrate processing method, storage medium, and substrate processing apparatus (2022-10-25),
7. 11407005 - Coating method, coating apparatus and recording medium (2022-08-09),
8. 11079679 - Substrate processing method and recording medium capable of suppressing non-uniformity in degree of progression of processing depending on position on substrate (2021-08-03),
9. 10359702 - Development processing apparatus, development processing method, and storage medium (2019-07-23),
10. 10203605 - Development method, development device, and non-transitory computer-readable storage medium (2019-02-12),
11. 10185220 - Substrate processing method, substrate processing apparatus, and non-transitory computer-readable medium (2019-01-22),
12. 10108111 - Developing method, developing apparatus, and storage medium (2018-10-23),

Title: Yusaku Hashimoto: Innovator in Substrate Processing Technologies

Introduction

Yusaku Hashimoto is a prominent inventor based in Koshi, Japan. He has made significant contributions to the field of substrate processing, holding a total of 12 patents. His innovative work focuses on enhancing the efficiency and effectiveness of substrate processing methods and apparatus.

Latest Patents

One of Hashimoto's latest patents is a substrate processing apparatus and method. This apparatus includes a holder designed to attract and hold a substrate, a supply for heated plating liquid, and a cover body that heats the plating liquid on the substrate. The holder features protrusions that project towards the substrate, ensuring optimal processing conditions. Another notable patent is a coating film forming method, which involves rotating a substrate while supplying a high-temperature gas to adjust the film thickness distribution. This method enhances the quality of the coating film while ensuring efficient drying.

Career Highlights

Yusaku Hashimoto is currently employed at Tokyo Electron Limited, a leading company in the semiconductor and electronics manufacturing industry. His work at the company has allowed him to develop and refine his innovative technologies, contributing to advancements in substrate processing.

Collaborations

Throughout his career, Hashimoto has collaborated with notable colleagues, including Masahiro Fukuda and Kouichirou Tanaka. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies in substrate processing.

Conclusion

Yusaku Hashimoto's contributions to substrate processing technologies have established him as a key figure in the field. His innovative patents and collaborative efforts continue to influence advancements in the industry.

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