Location History:
- Yongin, KR (2004)
- Gyeonggi-do, KR (2008)
- Kyungki-do, KR (2008)
- Suwon, KR (2007 - 2010)
- Suwon-si, KR (2006 - 2012)
Company Filing History:
Years Active: 2004-2012
Title: The Innovative Contributions of Yuri Nikolaevich Tolmachev
Introduction
Yuri Nikolaevich Tolmachev is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of plasma technology, holding a total of 10 patents. His work primarily focuses on developing advanced plasma generating apparatuses that enhance efficiency and applicability in various industries.
Latest Patents
Tolmachev's latest patents include a plasma generating apparatus designed for superior plasma generation efficiency. This apparatus utilizes a single reaction chamber and incorporates a radio frequency (RF) generator, an antenna for generating an electromagnetic field, and a reaction chamber for exciting and ionizing a reaction gas. Additionally, he has developed an apparatus and method to generate plasma applicable to semiconductor processing. This invention features a chamber with a plasma generating space, a lower electrode, an upper electrode, and a power supply to facilitate the generation of plasma.
Career Highlights
Tolmachev is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate and contribute to the advancement of plasma technologies. His work has been instrumental in enhancing the efficiency of plasma generation, which is crucial for various applications, including semiconductor manufacturing.
Collaborations
Throughout his career, Tolmachev has collaborated with notable colleagues such as Dong-joon Ma and Sergiy Yakovlevich Navala. These collaborations have further enriched his research and development efforts, leading to groundbreaking advancements in plasma technology.
Conclusion
Yuri Nikolaevich Tolmachev's contributions to plasma technology are noteworthy and impactful. His innovative patents and ongoing work at Samsung Electronics Co., Ltd. continue to shape the future of this field.