The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 01, 2012
Filed:
May. 01, 2008
Sang Jean Jeon, Hwaseong-si, KR;
Yuri Tolmachev, Suwon-si, KR;
Su Ho Lee, Seongnam-si, KR;
Seoung Hyun Seok, Suwon-si, KR;
Young Min Park, Suwon-si, KR;
Won Hyuk Jang, Seoul, KR;
Sang Jean Jeon, Hwaseong-si, KR;
Yuri Tolmachev, Suwon-si, KR;
Su Ho Lee, Seongnam-si, KR;
Seoung Hyun Seok, Suwon-si, KR;
Young Min Park, Suwon-si, KR;
Won Hyuk Jang, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-Si, KR;
Abstract
A plasma generating apparatus having superior plasma generation efficiency that uses a single reaction chamber. The plasma generating apparatus includes a RF generator for providing a RF power, an antenna for generating an electromagnetic field upon receiving the RF power, a reaction chamber for exciting/ionizing a reaction gas via the electromagnetic field, and generating a plasma, and a plasma channel for absorbing the RF power, and allowing a current signal to be induced to the plasma.