Won Hyuk Jang

Title: Innovations by Won Hyuk Jang

Introduction

Won Hyuk Jang is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of semiconductor cleaning technologies. With a total of 7 patents to his name, Jang's work focuses on advanced cleaning solutions and systems that enhance semiconductor manufacturing processes.

Latest Patents

Among his latest patents are innovative systems and methods for producing cleaning solutions. One notable invention is a cleaning solution production system designed specifically for cleaning semiconductor substrates. This system includes a pressure tank and a plasma reaction tank that generates radical species in a decompressed liquid. The generated cleaning solution is then stored in a tank and supplied to the semiconductor substrate through a nozzle.

Another significant patent involves a plasma generator and a cleaning liquid processing apparatus. This apparatus features a bubble formation section that lowers the pressure of a mixed liquid to create bubbles. The plasma generator applies voltage to form plasma within these bubbles, allowing for the dissolution of radicals into the mixed liquid. This mixture is then discharged to clean wafers effectively.

Career Highlights

Throughout his career, Won Hyuk Jang has worked with leading companies in the electronics industry, including Samsung Electronics and LG Electronics. His experience in these organizations has allowed him to develop and refine his innovative technologies in semiconductor cleaning.

Collaborations

Jang has collaborated with notable colleagues such as Myong Hun Im and Beom Jin Yoo. Their combined expertise has contributed to the advancement of cleaning technologies in the semiconductor field.

Conclusion

Won Hyuk Jang's contributions to semiconductor cleaning technologies through his innovative patents have significantly impacted the industry. His work continues to pave the way for advancements in manufacturing processes.