Samsung Electronics Co., Ltd.

Lg Electronics Inc.

Won Hyuk Jang

Sung Hoon Kim

Myong Hun Im

Sang Ki Nam

Kyu Hee Han

Min Hyoung Kim

Young Min Park

Kwang Hyun Kim

Soo Young Oh

Chang Woo Son

Sung Min Lee

Yuri Nikolaevich Tolmachev

Bo Sung Seo

Sang Hee Yoo

Young Sung Jung

Beom Jin Yoo

Young Do Kim

Jeong Min Bang

Su Ho Lee

Sang Jean Jeon

Jin Woo Seo

Lu Siqing

Seoung Hyun Seok

Jae-Kyum Kim

In Yeol Kim

Jong Ryul Choi

Bong Gon Ryu

Sung Hoon Kiim

A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.

Cleaning solution production systems and methods, and plasma reaction tanks

A plasma generator, a cleaning liquid processing apparatus including the same, a semiconductor cleaning apparatus, and a cleaning liquid processing method are provided. The cleaning liquid processing apparatus comprising a bubble formation section configured to lower a pressure of a mixed liquid obtained by mixing a liquid and a gas to form bubbles in the mixed liquid, a plasma generator connected to the bubble formation section and configured to apply a voltage to the mixed liquid to form plasma in the bubbles formed in the mixed liquid, a mixing section connected to the plasma generator and configured to dissolve radicals included in the plasma into the mixed liquid, and a discharge nozzle connected to the mixing section and configured to discharge the mixed liquid to a wafer.

Plasma generator, cleaning liquid processing apparatus, semiconductor device cleaning apparatus, cleaning liquid processing method, and method of manufacturing semiconductor device

A method for washing of the present invention comprises: a water supply step of supplying water into a tub; a motor actuating step of actuating the motor for rotating a drum provided inside the tub; and a spray step of spraying water into the drum through a gasket nozzle by actuating a pump for circulating the water inside the tub, when the motor stops.

Method for washing utilizing quantity of laundry

A method for washing of the present invention, comprises: a turbo wash setting step of setting turbo wash for spraying water into a drum through a spiral nozzle, when laundry rotates while being attached to the drum by a rotation of the drum; a continuous water supply step of supplying water into a tub; and a regular washing step of canceling the turbo wash when a time taken for a water level inside the tub to reach a target level is longer than a target time so that the water is not sprayed through the spiral nozzle when the laundry rotates while being attached to the drum by the rotation of the drum.

Method for washing

A washing machine comprises a casing; a tub disposed inside the casing; a drum rotatably provided inside the tub, for accommodating laundry therein; and a spiral nozzle for rotating supplied water in a predetermined direction and then spraying the water into the drum through discharge hole, wherein the spiral nozzle comprises an impingement surface formed in front of the discharge hole so that the water discharged from the discharge hole is distributed by impinging on the impingement surface.

Washer

A plasma generating apparatus having superior plasma generation efficiency that uses a single reaction chamber. The plasma generating apparatus includes a RF generator for providing a RF power, an antenna for generating an electromagnetic field upon receiving the RF power, a reaction chamber for exciting/ionizing a reaction gas via the electromagnetic field, and generating a plasma, and a plasma channel for absorbing the RF power, and allowing a current signal to be induced to the plasma.

Plasma generating apparatus

Growing community of inventors

Seoul, South Korea

Won Hyuk Jang