The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2023
Filed:
Jul. 21, 2021
Samsung Electronics Co., Ltd., Suwon-si, KR;
Beom Jin Yoo, Hwaseong-si, KR;
Min Hyoung Kim, Seoul, KR;
Sang Ki Nam, Seongnam-si, KR;
Won Hyuk Jang, Seoul, KR;
Kyu Hee Han, Seongnam-si, KR;
Young Do Kim, Hwaseong-si, KR;
Jeong Min Bang, Seoul, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A cleaning solution production system is for cleaning a semiconductor substrate. The system includes a pressure tank, a plasma reaction tank configured to form a plasma in gas bubbles suspended in a decompressed liquid obtained from the pressure tank to thereby generate radical species in the decompressed liquid, a storage tank configured to store a cleaning solution containing the radical species generated in the plasma reaction tank, and a nozzle configured to supply the cleaning solution from the storage tank to a semiconductor substrate.