The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 07, 2007
Filed:
Nov. 17, 2003
Tae-wan Kim, Yongin, KR;
Yuri Nikolaevich Tolmachev, Suwon, KR;
Dong-joon MA, Anyang, KR;
Sergiy Yakovlevich Navala, Suwon, KR;
Tae-wan Kim, Yongin, KR;
Yuri Nikolaevich Tolmachev, Suwon, KR;
Dong-joon Ma, Anyang, KR;
Sergiy Yakovlevich Navala, Suwon, KR;
Samsung Electronics Co., Ltd., Suwon, Kyungki-do, KR;
Abstract
A gas injection apparatus for injecting a reactive gas into a reaction chamber of a semiconductor processing system includes an injector in contact with an inner surface of a wall of the reaction chamber. The injector has a plurality of nozzles through which the reactive gas is injected into the reaction chamber. A gas inlet penetrates the wall of the reaction chamber. A manifold is disposed between the wall of the reaction chamber and the injector, and supplies the reactive gas flowing through the gas inlet to the nozzles. Gas channels in the manifold are arranged on a plurality of levels to equalize the lengths of gas paths connecting the gas inlet to each of the plurality of nozzles. This configuration makes the flow rate of reactive gas supplied through each of the plurality of nozzles to the reaction chamber uniform.