The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 30, 2006
Filed:
Jan. 13, 2004
Sergiy Yakovlevich Navala, Suwon-si, KR;
Yuri Nikolaevich Tolmachev, Suwon-si, KR;
Dong-joon MA, Anyang-si, KR;
Tae-wan Kim, Yongin-si, KR;
Sergiy Yakovlevich Navala, Suwon-si, KR;
Yuri Nikolaevich Tolmachev, Suwon-si, KR;
Dong-joon Ma, Anyang-si, KR;
Tae-wan Kim, Yongin-si, KR;
Samsung Electronics Co., Ltd., Suwon-si, KR;
Abstract
A magnetron cathode and a sputtering apparatus including the same are provided. The magnetron cathode includes three or more magnet units, each of which comprises a single magnet or a plurality of magnets having the same poles facing toward the same direction, wherein one magnet unit is disposed around the outer circumference of another magnet unit and adjacent magnet units have opposite poles facing toward the same direction. Uniform magnetic field distribution is obtained. Therefore, the erosion profile of a target is wide and uniform.