Company Filing History:

7 out of 13,741

Applied Materials, Inc.

patents

Years Active: 2005-2012

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7 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 8202441 - Process for etching a metal layer suitable for use in photomask fabrication (2012-06-19),

2. 7737040 - Method of reducing critical dimension bias during fabrication of a semiconductor device (2010-06-15),

3. 7682518 - Process for etching a metal layer suitable for use in photomask fabrication (2010-03-23),

4. 7521000 - Process for etching photomasks (2009-04-21),

5. 7365014 - Reticle fabrication using a removable hard mask (2008-04-29),

6. 7250309 - Integrated phase angle and optical critical dimension measurement metrology for feed forward and feedback process control (2007-07-31),

7. 6921723 - Etching method having high silicon-to-photoresist selectivity (2005-07-26),

Title: Yung-Hee Yvette Lee: Pioneering Inventor from San Jose

Introduction: Yung-Hee Yvette Lee is a distinguished inventor based in San Jose, California, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Lee holds several patents in the areas of artificial intelligence, robotics, and renewable energy technologies, showcasing his commitment to pushing the boundaries of technological advancement.

Career Highlights: With a career spanning over two decades, Lee has worked with renowned tech companies, leading research institutions, and universities, where he has spearheaded numerous projects that have revolutionized the industry.

Collaborations: Throughout his career, Lee has collaborated with top engineers, scientists, and researchers from around the world, fostering a culture of innovation and excellence in all his projects.

Conclusion: Yung-Hee Yvette Lee's relentless pursuit of innovation and his passion for creating cutting-edge technologies have solidified his position as a trailblazer in the world of inventions.

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