Location History:
- Hsin-Chu, TW (1995)
- Taichung, TW (2000 - 2009)
Company Filing History:
2 out of 7,087 
2 out of 112 
Years Active: 1995-2009
Title: Yueh-Lin Chou: Innovator in Phase-Shift Mask Technology
Introduction
Yueh-Lin Chou is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, particularly in the development of phase-shifting masks. With a total of 4 patents to his name, Chou's work has advanced the technology used in lithography processes.
Latest Patents
Chou's latest patents include innovative methods that enhance the functionality and accuracy of phase-shifting masks. One of his notable inventions is a method for checking the phase shift angle of a phase shift mask. This method involves acquiring a calibration curve of a characteristic value of lithography performance in relation to the phase shift angle of a specific type of phase shift mask. By transferring the patterns of the mask to a photoresist layer, he measures the characteristic value and derives the real phase shift angle based on the calibration curve.
Another significant patent is a method for forming an attenuated phase-shifting mask. This invention outlines a process that includes stacking a phase-shifting layer, opaque layer, and undeveloped photoresist layer on a transparent plate. The method details the steps for removing parts of the photoresist layer and the opaque layer to expose the phase-shifting layer, ultimately leading to the formation of a complete attenuated phase-shifting mask.
Career Highlights
Throughout his career, Yueh-Lin Chou has worked with notable companies in the semiconductor industry, including United Microelectronics Corporation and Worldwide Semiconductor Manufacturing Corporation. His experience in these organizations has contributed to his expertise in lithography and mask technology.
Collaborations
Chou has collaborated with several professionals in his field, including Wen-An Loong and Shyi-Long Shy, who have contributed to his research and development efforts.
Conclusion
Yueh-Lin Chou's innovative work in phase-shifting mask technology has made a significant impact on the semiconductor industry. His patents reflect a deep understanding of lithography processes and continue to influence advancements in the field.