The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 26, 1995
Filed:
Nov. 23, 1994
Wen-An Loong, Hsin-Chu, TW;
Shyi-Long Shy, Hsin-Chu, TW;
Hong-Tsz Pan, Chang-Hua, TW;
Ming-Tzong Yang, Hsin-Chu, TW;
Guey-Chi Guo, Hsin-Chu, TW;
Yueh-Lin Chou, Hsin-Chu, TW;
United Microelectronics Corporation, Hsinchu, CN;
Abstract
This invention describes the fabrication and use of a self-aligning phase shifting mask comprised of phase shifting material formed over a patterned layer of half-tone or partially transmitting material. The interaction of light passing through the phase shifting and partially transmitting areas of the mask, the phase shifting only areas of the mask, and the non phase shifting transparent areas of the mask provides greater image resolution and depth of focus tolerance than other lithography methods including other known phase shifting techniques.