This inventor holds 1 USPTO granted patent. Top assignee: United Microelectronics Corp.. Active years: 1995.
Company Filing History:
Years Active: 1995
Title: Innovations of Guey-Chi Guo
Introduction
Guey-Chi Guo is a notable inventor based in Hsinchu, Taiwan. He is recognized for his contributions to the field of lithography, particularly through his innovative patent that enhances image resolution and depth of focus tolerance.
Latest Patents
Guey-Chi Guo holds a patent for a "Half-tone self-aligning phase shifting mask." This invention describes the fabrication and use of a self-aligning phase shifting mask comprised of phase shifting material formed over a patterned layer of half-tone or partially transmitting material. The interaction of light passing through the phase shifting and partially transmitting areas of the mask, the phase shifting only areas of the mask, and the non-phase shifting transparent areas of the mask provides greater image resolution and depth of focus tolerance than other lithography methods, including other known phase shifting techniques. He has 1 patent to his name.
Career Highlights
Guey-Chi Guo is currently employed at United Microelectronics Corporation, a leading semiconductor foundry. His work at this company has allowed him to contribute significantly to advancements in lithography technology.
Collaborations
Some of his coworkers include Shyi-Long Shy and Hong-Tsz Pan, who have collaborated with him on various projects within the company.
Conclusion
Guey-Chi Guo's innovative work in lithography, particularly with his self-aligning phase shifting mask, showcases his significant contributions to the field. His efforts continue to influence advancements in semiconductor technology.