The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 10, 2002
Filed:
Mar. 24, 2000
Abstract
This invention discloses a method for forming an attenuated phase-shifting mask, including following steps. A transparent plate is provided, on which a phase-shifting layer, opaque layer, and undeveloped photoresist layer being stacked on the transparent plate successively. A first part of the photoresist layer is removed until exposing a first region of the opaque layer. The first region of the opaque layer is removed for exposing parts of the phase-shifting layer. A second part of the photoresist layer is removed for exposing a second region of the opaque layer. The exposed phase-shifting layer is then etched by employing the opaque layer as an etching mask. Then the exposed opaque layer and photoresist layer are successively remove, thus forming a complete attenuated phase-shifting mask.