This inventor holds 1 USPTO granted patent. Top assignee: Worldwide Semiconductor Manufacturing Corporation. Active years: 2002.
Company Filing History:
Years Active: 2002
Title: Innovations of Ching-Liang Wu
Introduction
Ching-Liang Wu is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of semiconductor technology. His innovative work has led to the development of a unique patent that enhances the manufacturing process of phase-shifting masks.
Latest Patents
Ching-Liang Wu holds a patent titled "Method for forming an attenuated phase-shifting mask." This invention discloses a method for forming an attenuated phase-shifting mask, which includes several steps. A transparent plate is provided, on which a phase-shifting layer, opaque layer, and undeveloped photoresist layer are stacked successively. A first part of the photoresist layer is removed until exposing a first region of the opaque layer. The first region of the opaque layer is then removed to expose parts of the phase-shifting layer. A second part of the photoresist layer is removed to expose a second region of the opaque layer. The exposed phase-shifting layer is then etched by employing the opaque layer as an etching mask. Finally, the exposed opaque layer and photoresist layer are successively removed, thus forming a complete attenuated phase-shifting mask. Ching-Liang Wu has 1 patent to his name.
Career Highlights
Ching-Liang Wu is currently employed at Worldwide Semiconductor Manufacturing Corporation, where he continues to innovate in the semiconductor industry. His work has been instrumental in advancing technologies that are crucial for modern electronics.
Collaborations
Ching-Liang Wu has collaborated with several talented individuals in his field, including Yueh-Lin Chou and Jen-Hui Tseng. Their combined expertise has contributed to the success of various projects within the semiconductor sector.
Conclusion
Ching-Liang Wu's contributions to the field of semiconductor technology through his innovative patent demonstrate his commitment to advancing the industry. His work continues to influence the development of essential manufacturing processes.