Company Filing History:
Years Active: 2011-2021
Title: Innovations of Yuan-Cheng Yang
Introduction
Yuan-Cheng Yang is a notable inventor based in Kaohsiung, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. His work focuses on processes that enhance the efficiency and effectiveness of electronic components.
Latest Patents
One of his latest patents is a gate oxide forming process. This process involves several steps, including providing a substrate with a first area and a second area. A first oxide layer, a silicon-containing cap layer, and a second oxide layer are sequentially and blanketly formed on the substrate. The silicon-containing cap layer and the second oxide layer in the first area are then removed. An oxidation process is performed to oxidize the silicon-containing cap layer, resulting in the formation of a gate oxide layer in the second area.
Another significant patent is the fabricating method of a shallow trench isolation structure. This method begins with providing a substrate, wherein a high voltage device area is defined. A first etching process is performed to partially remove the substrate, forming a preliminary shallow trench in the high voltage device area. A second etching process further removes the substrate corresponding to the preliminary shallow trench, resulting in the formation of a first shallow trench. Finally, a dielectric material is filled in the first shallow trench, creating a first shallow trench isolation structure.
Career Highlights
Yuan-Cheng Yang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His innovative work has contributed to advancements in semiconductor manufacturing processes.
Collaborations
He has collaborated with notable coworkers, including Chin-Fu Lin and Yi-Han Su, who have also contributed to various projects within the company.
Conclusion
Yuan-Cheng Yang's contributions to semiconductor technology through his patents and collaborative efforts highlight his importance in the field. His innovative processes continue to influence advancements in electronic components.