Taoyuan, Taiwan

Yu-Chi Sun


Average Co-Inventor Count = 2.6

ph-index = 2

Forward Citations = 12(Granted Patents)


Location History:

  • Pingjen, TW (2003 - 2004)
  • Taoyuan, TW (2004)

Company Filing History:


Years Active: 2003-2004

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4 patents (USPTO):Explore Patents

Title: Innovations of Yu-Chi Sun

Introduction

Yu-Chi Sun is a prominent inventor based in Taoyuan, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 4 patents. His work focuses on methods that enhance the fabrication processes in semiconductor manufacturing.

Latest Patents

One of Yu-Chi Sun's latest patents is the "Etch-back method for dielectric layer." This innovative method involves the use of reactive ion etching (RIE) with gases, including equal amounts of CF4 and CHF3, along with argon diluent gas. The precise control of gas ratios during the etching process leads to improved uniformity of inter-layer dielectric (ILD) or inter-metal dielectric (IMD) layers compared to conventional chemical mechanical polishing (CMP) processes. Another notable patent is the "Method for fabricating floating gate." This method outlines a process for creating a floating gate on a semiconductor substrate, involving the sequential etching of insulating and conducting layers to form a round-cornered trench, ultimately leading to the formation of a floating gate.

Career Highlights

Yu-Chi Sun is currently employed at Nan Ya Technology Corporation, where he continues to innovate in semiconductor technologies. His expertise in etching and fabrication methods has positioned him as a valuable asset in the industry.

Collaborations

Throughout his career, Yu-Chi Sun has collaborated with notable colleagues, including Tse-Yao Huang and Chao-Wen Lay. These collaborations have further enriched his work and contributed to advancements in semiconductor manufacturing.

Conclusion

Yu-Chi Sun's contributions to semiconductor technology through his innovative patents and collaborative efforts highlight his importance in the field. His work continues to influence the industry and pave the way for future advancements.

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