Young-rae Park

Title: Young-rae Park: Innovator in Semiconductor Technology

Introduction

Young-rae Park is a prominent inventor based in Suwon, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 9 patents. His work primarily focuses on improving processes related to chemical mechanical polishing and semiconductor device manufacturing.

Latest Patents

Among his latest patents is a slurry for the chemical mechanical polishing process and a method for manufacturing semiconductor devices using the same. This slurry composition is designed for effective chemical mechanical polishing of material layers, such as silicon oxide. The first material surface exposed to the slurry demonstrates hydrophilicity, while a second material layer, like polysilicon, shows hydrophobicity, serving as a polishing stopping layer. The composition consists of water, abrasive grains, and a polymer additive with both hydrophilic and hydrophobic functional groups. Another notable patent involves a method for isolating self-aligned contact pads in semiconductor devices. This method determines the necessary chemical mechanical polishing process time to achieve the desired isolation of the self-aligned contact pads, utilizing a relationship equation derived from a test semiconductor device.

Career Highlights

Young-rae Park is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technology. His expertise and contributions have positioned him as a key figure in the industry.

Collaborations

He has collaborated with notable colleagues, including Jung-Yup Kim and Sang-rok Hah, further enhancing the innovative efforts at Samsung Electronics.

Conclusion

Young-rae Park's work in semiconductor technology exemplifies the impact of innovation in the industry. His patents and contributions continue to shape the future of semiconductor manufacturing processes.