The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2007
Filed:
Aug. 12, 2003
Young-rae Park, Suwon, KR;
Jung-yup Kim, Seoul, KR;
Bo-un Yoon, Seoul, KR;
Kwang-bok Kim, Kyungki-do, KR;
Jae-phil Boo, Suwon, KR;
Jong-won Lee, Sungnam, KR;
Sang-rok Hah, Seoul, KR;
Kyung-hyun Kim, Seoul, KR;
Chang-ki Hong, Suwon, KR;
Young-rae Park, Suwon, KR;
Jung-yup Kim, Seoul, KR;
Bo-un Yoon, Seoul, KR;
Kwang-bok Kim, Kyungki-do, KR;
Jae-phil Boo, Suwon, KR;
Jong-won Lee, Sungnam, KR;
Sang-rok Hah, Seoul, KR;
Kyung-hyun Kim, Seoul, KR;
Chang-ki Hong, Suwon, KR;
Abstract
A slurry composition useful for chemical mechanical polishing of the surface of a material layer, e.g., a silicon oxide layer, is disclosed. A first material surface which is exposed to the slurry exhibits hydrophilicity, while a second material layer, e.g., a polysilicon layer, the surface of which is also exposed to the slurry, exhibits hydrophobicity, and accordingly acts as a polishing stopping layer. The slurry composition consists essentially of water, abrasive grains, and a polymer additive having both hydrophilic and hydrophobic functional groups.