Location History:
- Beijing, CN (2013)
- Shanghai, CN (2013 - 2019)
Company Filing History:
3 out of 934 
2 out of 78 
2 out of 1,724 
Years Active: 2013-2019
Title: The Innovative Contributions of Youfeng He
Introduction
Youfeng He is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly in the development of fin field-effect transistors. With a total of seven patents to his name, He has established himself as a key figure in innovation within the semiconductor industry.
Latest Patents
Youfeng He's latest patents focus on the fabrication of fin field-effect transistors. One of his notable inventions describes a method for fabricating these transistors, which includes providing a substrate and forming a plurality of fins on its surface. The method also involves creating a transitional layer with atoms identical to those of the fins on their side and top surfaces through a deposition process. Additionally, an oxidation process is performed to convert the transitional layer and a surface portion of the fins into a dielectric material, ultimately forming a gate dielectric layer on the fins. This innovative approach enhances the performance and efficiency of fin field-effect transistors.
Career Highlights
Throughout his career, Youfeng He has worked with leading companies in the semiconductor industry, including Semiconductor Manufacturing International Corporation and Semiconductor Manufacturing International Corp. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking advancements in semiconductor technology.
Collaborations
Youfeng He has collaborated with notable professionals in his field, including Fumitake Mieno and Xiaopeng Yu. These collaborations have further enriched his work and have led to significant advancements in the technology he specializes in.
Conclusion
Youfeng He is a distinguished inventor whose work in fin field-effect transistors has made a lasting impact on the semiconductor industry. His innovative methods and collaborations with other experts highlight his commitment to advancing technology. His contributions continue to shape the future of semiconductor applications.