Yoshitaka Noda

Title: Innovations by Yoshitaka Noda

Introduction

Yoshitaka Noda is a prominent inventor based in Bisai, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work focuses on methods that enhance the production and efficiency of semiconductor devices.

Latest Patents

One of his latest patents is a method of production of a semiconductor device that features a semiconductor layer and a support substrate spaced apart by a recess. This innovative production method involves trench etching to create a trench in the thickness direction of the semiconductor layer. The process ensures that both the first and second pattern portions are formed with side walls facing each other across the trench. During trench etching, the semiconductor layer is etched while a protective film is formed on its surface, allowing both pattern portions to maintain the same potential or temperature throughout the etching process.

Another notable patent is a method of plasma etching a trench in a semiconductor substrate. In this method, a trench is etched in a semiconductor wafer by converting a first introduced gas into plasma within a reaction chamber. A protective film is then formed on the trench wall surface by turning a second introduced gas into plasma. The protection film on the trench's bottom surface is subsequently removed using a third introduced gas, followed by evacuating the reaction chamber.

Career Highlights

Yoshitaka Noda is currently employed at Denso Corporation, where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the methods used in semiconductor production, contributing to the efficiency and effectiveness of the industry.

Collaborations

Throughout his career, Noda has collaborated with notable colleagues such as Hitoshi Yamaguchi and Junji Oohara. These collaborations have further enriched his work and have led to advancements in semiconductor technologies.

Conclusion

Yoshitaka Noda's contributions to semiconductor technology through his innovative patents have significantly impacted the industry. His dedication to improving production methods showcases the importance of innovation in technology.