Company Filing History:

11 out of 10,341

Tokyo Electron Limited

patents

3 out of 52,751

Kabushiki Kaisha Toshiba

patents

2 out of 71

Tokyo Electron Yamanashi Limited

patents

where one patent can have more than one assignee

Years Active: 1992-2021

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10950452 - Seasoning method and etching method (2021-03-16),

2. 10818502 - System and method of plasma discharge ignition to reduce surface particles (2020-10-27),

3. 9530626 - Method and apparatus for ESC charge control for wafer clamping (2016-12-27),

4. 5772833 - Plasma etching apparatus (1998-06-30),

5. 5717294 - Plasma process apparatus (1998-02-10),

6. 5556500 - Plasma etching apparatus (1996-09-17),

7. 5368684 - Etching method for a silicon-containing layer using hydrogen bromide (1994-11-29),

8. 5271788 - Plasma processing apparatus (1993-12-21),

9. 5259923 - Dry etching method (1993-11-09),

10. 5240556 - Surface-heating apparatus and surface-treating method (1993-08-31),

11. 5164034 - Apparatus and method for processing substrate (1992-11-17),

Title: The Innovative Contributions of Yoshio Ishikawa

Introduction

Yoshio Ishikawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of microelectronics, holding a total of 11 patents. His work focuses on improving processes within the semiconductor industry, particularly in plasma processing technologies.

Latest Patents

Ishikawa's latest patents include a seasoning method and an etching method designed to enhance the efficiency of maintenance processes within chambers used for microelectronic workpieces. The seasoning method involves a two-step dry cleaning process that utilizes Ogas and a processing gas containing fluorine to clean and prepare the chamber for operation. Additionally, he has developed a system and method for plasma discharge ignition that aims to reduce surface particles, thereby minimizing defects during plasma processing. This innovative approach involves the use of multiple RF power sources and a DC power supply to maintain plasma within the process chamber.

Career Highlights

Throughout his career, Yoshio Ishikawa has worked with notable companies such as Tokyo Electron Limited and Toshiba Corporation. His experience in these leading organizations has allowed him to refine his expertise in plasma processing and contribute to advancements in microelectronic manufacturing.

Collaborations

Ishikawa has collaborated with esteemed colleagues, including Keiji Horioka and Takashi Enomoto. These partnerships have fostered a collaborative environment that encourages innovation and the sharing of ideas within the field.

Conclusion

Yoshio Ishikawa's contributions to the field of microelectronics through his patents and collaborative efforts highlight his role as a key innovator. His work continues to influence advancements in semiconductor processing technologies.

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