The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 1998
Filed:
Nov. 17, 1994
Applicant:
Inventors:
Koichiro Inazawa, Tokyo, JP;
Yoshio Ishikawa, Tokyo, JP;
Takashi Asakawa, Tokyo, JP;
Masato Hiratsuka, Tokyo, JP;
Nobuyuki Okayama, Tokyo, JP;
Assignee:
Tokyo Electron Limited, , JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L / ;
U.S. Cl.
CPC ...
1563 / ; 1563 / ; 1563 / ; 1563 / ; 1563 / ; 1563 / ; 1563 / ; 216 67 ;
Abstract
The present invention relates to a plasma etching method and a plasma etching apparatus, and more particularly to a plasma etching method and a plasma etching apparatus in which the selection ration is enhanced by improving trench side-wall protecting effect.