Company Filing History:
Years Active: 1998
Title: Masato Hiratsuka: Innovator in Plasma Etching Technology
Introduction
Masato Hiratsuka is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma etching technology, which is crucial in various manufacturing processes, particularly in the semiconductor industry. His innovative approach has led to advancements that enhance the efficiency and effectiveness of plasma etching methods.
Latest Patents
Hiratsuka holds a patent for a plasma etching apparatus. This invention relates to a plasma etching method and apparatus that improves the trench side-wall protecting effect, thereby enhancing the selection ratio. His patent is a testament to his expertise and commitment to advancing technology in this specialized field. He has 1 patent to his name.
Career Highlights
Masato Hiratsuka is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at Tokyo Electron has allowed him to collaborate with other talented professionals and contribute to groundbreaking innovations in plasma etching technology.
Collaborations
Some of his notable coworkers include Koichiro Inazawa and Yoshio Ishikawa. Their collaboration has fostered an environment of innovation and creativity, leading to advancements in their respective fields.
Conclusion
Masato Hiratsuka's contributions to plasma etching technology exemplify the impact of innovative thinking in the semiconductor industry. His work continues to influence the development of more efficient manufacturing processes.