The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 21, 1993
Filed:
Jul. 23, 1992
Applicant:
Inventors:
Makoto Hasegawa, Kawasaki, JP;
Takaya Matsushita, Yokohama, JP;
Keiji Horioka, Kawasaki, JP;
Isahiro Hasegawa, Zushi, JP;
Toshihisa Nozawa, Kobe, JP;
Yoshio Ishikawa, Tokyo, JP;
Masahito Hiratsuka, Kofu, JP;
Satoshi Kaneko, Kumamoto, JP;
Assignees:
Tokyo Electron Limited, Tokyo, JP;
Kabushiki Kaisha Toshiba, Kawasaki, JP;
Primary Examiner:
Int. Cl.
CPC ...
C23F / ;
U.S. Cl.
CPC ...
156345 ; 20429831 ; 20429834 ; 20429837 ;
Abstract
A magnetron plasma etching apparatus comprises a suscepter serving as an electrode on which a silicon wafer is mounted. A carbon ring having an outer diameter larger than the diameter of the wafer and an electrical resistance lower than that of the wafer, is arranged around the suscepter. The carbon ring is electrically connected to the suscepter. The carbon ring improves uniformity of etching of the wafer.