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For the Inventor, By the Inventor

Zushi, Japan

Isahiro Hasegawa

This inventor holds 27 USPTO granted patents, primarily in Plasma Processing. Top assignees: Kabushiki Kaisha Toshiba, Tokyo Electron Limited, Tdk Corporation. Active years: 1992-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Isahiro Hasegawa. Retrieved from https://idiyas.com/inventor/isahiro-hasegawa

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 27

% Patents Active = 100.0

Average Co-Inventor Count = 4.4

ph-index = 15

Forward Citations = 690(Granted Patents)


Location History:

  • Yokohama, JP (1992)
  • Kanagawa, JP (1994)
  • Zusi, JP (1995)
  • Zushi, JP (1992 - 1999)
  • Tokyo, JP (1992 - 2001)
  • Nerima, JP (2018)

Company Filing History:

goldMedal20 out of 53,262 
 
Kabushiki Kaisha Toshiba
 patents
silverMedal19 out of 10,904 
 
Tokyo Electron Limited
 patents
bronzeMedal1 out of 8,257 
 
Tdk Corporation
 patents
4. 1 out of 2,955 
 
Toshiba Memory Corporation
 patents
5. 1 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1992-2018

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Areas of Expertise:
Plasma Processing
Semiconductor Memory
Dry Etching
Magnetron Plasma
Electrostatic Chuck
Surface Processing
Temperature Adjustment
Pattern Profile Measurement
Permanent Magnet Circuit
Film Etching
3D Stacking
Wafer Processing
27 patents (USPTO):Explore Patents
1. 9922991 - Semiconductor memory device and method for manufacturing same (2018-03-20),
2. 6261428 - Magnetron plasma process apparatus (2001-07-17),
3. 5888338 - Magnetron plasma processing apparatus and processing method (1999-03-30),
4. 5698070 - Method of etching film formed on semiconductor wafer (1997-12-16),
5. 5660744 - Plasma generating apparatus and surface processing apparatus (1997-08-26),
6. 5660671 - Magnetron plasma processing apparatus and processing method (1997-08-26),
7. 5539179 - Electrostatic chuck having a multilayer structure for attracting an (1996-07-23),
8. 5474643 - Plasma processing apparatus (1995-12-12),
9. 5444207 - Plasma generating device and surface processing device and method for (1995-08-22),
10. 5387893 - Permanent magnet magnetic circuit and magnetron plasma processing (1995-02-07),
11. 5376211 - Magnetron plasma processing apparatus and processing method (1994-12-27),
12. 5356515 - Dry etching method (1994-10-18),
13. 5310454 - Dry etching method (1994-05-10),
14. 5302236 - Method of etching object to be processed including oxide or nitride (1994-04-12),
15. 5290381 - Plasma etching apparatus (1994-03-01),

Title: The Innovative Mind of Isahiro Hasegawa

Introduction: Isahiro Hasegawa, a pioneering inventor hailing from Zushi, Japan, is renowned for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Isahiro Hasegawa's recent patents showcase his commitment to pushing the boundaries of technological advancement, with a focus on improving efficiency and functionality in various industries.

Career Highlights: Throughout his illustrious career, Isahiro Hasegawa has consistently demonstrated a knack for developing cutting-edge solutions to complex problems. His innovative spirit has led to the creation of numerous revolutionary inventions that have reshaped the technological landscape.

Collaborations: Isahiro Hasegawa has collaborated with leading experts and organizations in the industry, leveraging collective knowledge and expertise to drive innovation forward. His collaborative efforts have resulted in the development of groundbreaking technologies that have had a lasting impact on society.

Conclusion: In conclusion, Isahiro Hasegawa stands as a visionary inventor whose relentless pursuit of innovation has left an indelible mark on the world of technology. His passion for pushing the boundaries of what is possible continues to inspire future generations of inventors and innovators.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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