This inventor holds 8 USPTO granted patents and 1 published patent application. Top assignees: Intel Corporation, Dai Nippon Printing Co., Ltd., Renesas Technology Corp.. Active years: 2001-2024.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Tokyo, JP (2001)
- Saitama-ken, JP (2005)
- Ibaraki, JP (2007)
- Tsukuba, JP (2006 - 2024)
Company Filing History:
7 out of 56,290 
1 out of 3,208 
1 out of 3,781 
Years Active: 2001-2024
Title: The Innovations of Yoshihiro Tezuka
Introduction
Yoshihiro Tezuka is a prominent inventor based in Tsukuba, Japan. He has made significant contributions to the field of lithography, particularly in the development of measurement tools and methods for extreme ultraviolet (EUV) masks. With a total of 8 patents to his name, Tezuka's work has had a profound impact on the semiconductor industry.
Latest Patents
Tezuka's latest patents include a measurement tool and method for lithography masks. This innovative tool features a source assembly that generates a high-power EUV light beam, a detector assembly with a projection optics system and a CCD camera, and a stage for supporting a patterned mask. The processor is programmed to determine a site-specific best focus plane for each of the predetermined test sites on the patterned mask. Additionally, he has developed a method for generating a site-specific best focus plane using a continuous scanning process that provides a continuous image output from the test site. Another notable patent involves EUV mask inspection tools that include a source assembly generating an EUV beam, a detector assembly, and a processor programmed to analyze mask pattern data to generate an out-of-plane distortion map.
Career Highlights
Throughout his career, Yoshihiro Tezuka has worked with leading companies in the technology sector, including Intel Corporation and Renesas Technology Corporation. His expertise in lithography and measurement tools has positioned him as a key figure in advancing semiconductor manufacturing technologies.
Collaborations
Tezuka has collaborated with notable professionals in his field, including Masaaki Ito and Toshihiko Tanaka. These collaborations have further enriched his work and contributed to the development of innovative solutions in lithography.
Conclusion
Yoshihiro Tezuka's contributions to the field of lithography and his innovative patents have significantly advanced the technology used in semiconductor manufacturing. His work continues to influence the industry and inspire future innovations.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile