The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Dec. 30, 2005
Applicant:
Yoshihiro Tezuka, Tsukuba, JP;
Inventor:
Yoshihiro Tezuka, Tsukuba, JP;
Assignee:
Intel Corporation, Santa Clara, CA (US);
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An embodiment of the present invention is a technique to inspect defects in mask blanks. A first iris diaphragm is located at an illumination source to limit an illumination angle of light emitted from the illumination source. A scattering limit unit is located at exit of a dark field optical unit to limit scattering angle of the light scattered after reflecting from a mask blank. A defect analyzer is optically coupled to the dark field optical unit to generate an angular distribution of the scattered light. The angular distribution is used to characterize criticality of a defect found on the mask blank.