The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 14, 2023
Filed:
Sep. 22, 2021
Intel Corporation, Santa Clara, CA (US);
Yoshihiro Tezuka, Tsukuba, JP;
Marieke Ordway, San Jose, CA (US);
Charles Holzwarth, Austin, TX (US);
INTEL CORPORATION, Santa Clara, CA (US);
Abstract
The present disclosure is directed to EUV mask inspection tools including a source assembly that generates a EUV beam, a detector assembly having a projection optics system, a processor, a movable stage supporting a patterned mask, a stage control system, and a processor programmed to set the height for the stage based on instructions of a first program module that analyzes and combines mask pattern data and mask layout information to generate an out-of-plane distortion map. In an aspect, a second program module generates instructions to analyze inspection results outputted by the inspection tool to generate a defocus characterization map. In a further aspect, a present method provides predictive data and actual measured data to determine stage heights for use by a present mask inspection tool for inspection of patterned EUV masks to obtain results that compensate for defocusing to due to bowing of the patterned EUV mask.