Marieke Ordway

Title: Marieke Ordway: Innovator in EUV Lithography Technology

Introduction

Marieke Ordway is a prominent inventor based in San Jose, California. She has made significant contributions to the field of lithography, particularly in the development of measurement tools for extreme ultraviolet (EUV) lithography masks. Her innovative work has implications for the semiconductor industry, where precision and accuracy are paramount.

Latest Patents

Marieke Ordway holds a patent for a "Measurement tool and methods for EUV lithography masks." This patent describes an EUV mask inspection tool that includes a source assembly generating an EUV beam, a detector assembly with a projection optics system, and a processor. The tool features a movable stage that supports a patterned mask and a stage control system. The processor is programmed to set the height for the stage based on instructions from a program module that analyzes mask pattern data and layout information to create an out-of-plane distortion map. Additionally, a second program module generates instructions to analyze inspection results, producing a defocus characterization map. This method provides predictive and actual measured data to determine stage heights for effective inspection of patterned EUV masks, compensating for defocusing due to bowing.

Career Highlights

Marieke is currently employed at Intel Corporation, where she continues to push the boundaries of technology in her field. Her work is crucial in enhancing the efficiency and effectiveness of EUV lithography processes, which are essential for the production of advanced semiconductor devices.

Collaborations

Throughout her career, Marieke has collaborated with notable colleagues, including Yoshihiro Tezuka and Charles W Holzwarth. These collaborations have fostered innovation and have contributed to the advancement of technologies in the semiconductor industry.

Conclusion

Marieke Ordway is a trailblazer in the field of EUV lithography, with her patent and work at Intel Corporation showcasing her commitment to innovation. Her contributions are vital to the ongoing evolution of semiconductor manufacturing technologies.