Yong Gyu Han

USPTO Granted Patents = 11 (Patent Applications = 1)

Average Co-Inventor Count = 3.8

ph-index = 3

Forward Citations = 336(Granted Patents)

Company Filing History:

Samsung Sdi Co., Inc.

patents

4. 1 out of 832,680

Other

patents

Years Active: 2002-2022

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11 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 11396702 - Gas supply unit and substrate processing apparatus including the gas supply unit (2022-07-26),

2. 11222772 - Substrate processing apparatus (2022-01-11),

3. 11069510 - Substrate processing apparatus (2021-07-20),

4. 11001925 - Substrate processing apparatus (2021-05-11),

5. 10991439 - Memory device and an operating method of a memory device (2021-04-27),

6. 10950432 - Method of depositing thin film and method of manufacturing semiconductor device (2021-03-16),

7. 10934619 - Gas supply unit and substrate processing apparatus including the gas supply unit (2021-03-02),

8. 10861570 - Memory device and an operating method of a memory device (2020-12-08),

9. 10714335 - Method of depositing thin film and method of manufacturing semiconductor device (2020-07-14),

10. 6447983 - Smart photolithography (2002-09-10),

11. 6387576 - Black matrix and preparing method thereof, and a display device employing the black matrix (2002-05-14),

Title: Yong Gyu Han: Innovator in Substrate Processing Technology

Introduction

Yong Gyu Han is a prominent inventor based in Seoul, South Korea. He has made significant contributions to the field of substrate processing technology, holding a total of 11 patents. His innovative designs focus on improving the efficiency and uniformity of film processing in various applications.

Latest Patents

Among his latest patents are the "Gas supply unit and substrate processing apparatus including the gas supply unit." This invention provides a substrate processing apparatus that enhances film processing uniformity. The apparatus features a partition that creates a gas supply channel, along with a gas supply unit connected to this channel. A gas flow channel is formed within the gas supply unit, and it includes strategically placed through-holes that facilitate optimal gas flow. This design ensures improved performance in substrate processing applications.

Career Highlights

Yong Gyu Han has worked with notable companies such as ASML Holding B.V. and SK Hynix Inc. His experience in these organizations has allowed him to refine his skills and contribute to cutting-edge technologies in the semiconductor industry.

Collaborations

Throughout his career, Yong Gyu Han has collaborated with talented individuals, including Young Hoon Kim and Dae Youn Kim. These partnerships have fostered innovation and have led to the development of advanced technologies in substrate processing.

Conclusion

Yong Gyu Han's contributions to substrate processing technology are noteworthy, and his patents reflect his commitment to innovation. His work continues to influence the industry, paving the way for future advancements in the field.

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