The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2021
Filed:
Aug. 29, 2018
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventors:
Ki Chul Um, Gyeonggi-do, KR;
Hyun Soo Jang, Daejeon, KR;
Jeong Ho Lee, Seoul, KR;
Yong Gyu Han, Seoul, KR;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); C23C 16/509 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32082 (2013.01); C23C 16/509 (2013.01); H01J 37/3244 (2013.01); H01J 2237/026 (2013.01); H01J 2237/327 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3323 (2013.01);
Abstract
A plasma supply unit includes a first conductive portion, a second conductive portion having at least a part extending to overlap the first conductive portion, and a ground shield located between the first conductive portion and the second conductive portion, and a substrate processing apparatus including the plasma supply unit.