This inventor holds 7 USPTO granted patents. Top assignee: Kabushiki Kaisha Toshiba. Active years: 1991-1998.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1991-1998
Title: Yoichi Ohshima: Innovator in Semiconductor Technology
Introduction
Yoichi Ohshima is a prominent inventor based in Yokohama, Japan. He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work has been instrumental in advancing manufacturing methods for semiconductor devices.
Latest Patents
Ohshima's latest patents include a method of manufacturing semiconductor devices utilizing selective chemical vapor deposition (CVD). This method involves forming a first conductive region of a first conductive material to facilitate the growth of a conductive film through a selective growth method. Additionally, a second conductive region of a second conductive material is created to prevent the growth of a conductive film. An insulating layer is then applied over both conductive regions, and a through hole is formed in the insulating layer to allow for the filling of the hole with the conductive film. The conductive film is subsequently grown within the through hole over the first conductive region, effectively filling the hole.
Another notable patent is for a method of manufacturing a semiconductor memory device that features common field oxide films on a semiconductor substrate. These films are arranged in a stripe shape and are spaced apart. Gate insulating films are formed between the field oxide films, and word lines or control gate electrodes are created on these films. Grooves are formed in the gate insulating films and field oxide films, allowing for the formation of source regions of a second conductivity type in the substrate. A common source wiring region is also established to connect the respective source regions.
Career Highlights
Yoichi Ohshima is associated with Kabushiki Kaisha Toshiba, a leading company in the technology sector. His work at Toshiba has allowed him to focus on innovative semiconductor solutions that have a significant impact on the industry.
Collaborations
Ohshima has collaborated with notable coworkers, including Yoshiko Yamaguchi and Hideaki Aochi. Their combined expertise has contributed to the successful development of advanced semiconductor technologies.
Conclusion
In summary, Yoichi Ohshima is a key figure in semiconductor innovation, with a strong portfolio of patents that reflect his expertise and contributions to the field. His work continues to influence the development of semiconductor devices and manufacturing methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
