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For the Inventor, By the Inventor

Saratoga, CA, United States of America

Yixing Lin

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This inventor holds 17 USPTO granted patents and 2 published patent applications and 1 EPO patent, primarily in Semiconductor Processing. Top assignees: Applied Materials, Inc., Other. Active years: 2003-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Yixing Lin. Retrieved from https://idiyas.com/inventor/yixing-lin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 17 

% Patents Active = 58.8


Average Co-Inventor Count = 5.1

ph-index = 8

Forward Citations = 218(Granted Patents)


Company Filing History:

goldMedal16 out of 14,502 
 
Applied Materials, Inc.
 patents
silverMedal1 out of 834,601 
Other
 patents

Years Active: 2003-2026

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Areas of Expertise:
Matrix Code Labels
Metal Contamination Control
High-Temperature Coating
Yttrium Oxide
Plasma-Resistant Structures
Aluminum Electroplating
Layered Coating
Chamber Component Cleaning
Semiconductor Equipment Parts
Corrosive Environments
30 Nm LPC Testing
Anodized Aluminum
17 patents (USPTO):Explore Patents
1. 12572770 - Tracking system on matrix two-dimensional code labels (2026-03-10),
2. 11898245 - High throughput and metal contamination control oven for chamber component cleaning process (2024-02-13),
3. 11866821 - Substrate support cover for high-temperature corrosive environment (2024-01-09),
4. 11047035 - Protective yttria coating for semiconductor equipment parts (2021-06-29),
5. 10583465 - 30 nm in-line LPC testing and cleaning of semiconductor processing equipment (2020-03-10),
6. 10253406 - Method for forming yttrium oxide on semiconductor processing equipment (2019-04-09),
7. 10233554 - Aluminum electroplating and oxide formation as barrier layer for aluminum semiconductor process equipment (2019-03-19),
8. 8021743 - Process chamber component with layered coating and method (2011-09-20),
9. 7910218 - Cleaning and refurbishing chamber components having metal coatings (2011-03-22),
10. 7579067 - Process chamber component with layered coating and method (2009-08-25),
11. 7055732 - Semiconductor processing apparatus including plasma-resistant, welded aluminum structures (2006-06-06),
12. 7048814 - Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus (2006-05-23),
13. 7033447 - Halogen-resistant, anodized aluminum for use in semiconductor processing apparatus (2006-04-25),
14. 6776873 - Yttrium oxide based surface coating for semiconductor IC processing vacuum chambers (2004-08-17),
15. 6713188 - Clean aluminum alloy for semiconductor processing equipment (2004-03-30),

Title: The Innovative Journey of Yixing Lin

Introduction: Yixing Lin, a pioneering inventor based in Saratoga, CA, is known for her groundbreaking contributions to the field of technology and innovation.

Latest Patents: Yixing Lin's latest patents focus on advancements in artificial intelligence, renewable energy solutions, and sustainable technologies, showcasing her commitment to creating a more efficient and eco-friendly future.

Career Highlights: With a career spanning over two decades, Yixing Lin has held key roles in various tech companies, leading research and development teams to bring cutting-edge products to the market. Her innovative spirit and dedication have earned her recognition as a trailblazer in the industry.

Collaborations: Throughout her career, Yixing Lin has collaborated with top researchers, engineers, and designers to push the boundaries of technology. Her ability to work seamlessly in multidisciplinary teams has led to the successful development of several groundbreaking inventions.

Conclusion: Yixing Lin's passion for innovation, coupled with her relentless drive to make a positive impact on society, solidifies her position as a prominent figure in the world of inventors. Her work continues to inspire future generations to think creatively and push the limits of what is possible in the realm of technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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