Ying Ying Wang

Title: Innovations of Ying Ying Wang

Introduction

Ying Ying Wang is a prominent inventor based in Xin-Zhu, Taiwan. She has made significant contributions to the field of lithography, particularly in the semiconductor manufacturing industry. With a total of 9 patents to her name, her work has had a substantial impact on the efficiency and accuracy of wafer alignment processes.

Latest Patents

Among her latest patents, Ying Ying Wang has developed innovative methods for lithographic overlay correction and lithographic processes. One method involves receiving a wafer and measuring its surface topography. Based on this measurement, she calculates a topographical variation and performs either single-zone or multi-zone alignment compensation depending on the variation's magnitude. Another patent focuses on defining multiple zones over a wafer and executing multi-zone alignment compensation for each zone, ensuring precise wafer alignment and lithography exposure.

Career Highlights

Ying Ying Wang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where she continues to advance her research and development efforts. Her expertise in lithography has positioned her as a key player in the semiconductor industry, contributing to the development of cutting-edge technologies.

Collaborations

Ying Ying Wang has collaborated with notable colleagues, including Yung-Yao Lee and Heng-Hsin Liu. These partnerships have fostered a collaborative environment that enhances innovation and drives progress in their field.

Conclusion

Ying Ying Wang's contributions to lithography and semiconductor manufacturing exemplify her dedication to innovation. Her patents reflect her commitment to improving wafer alignment processes, making her a valuable asset to the industry.