The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 23, 2024

Filed:

Oct. 27, 2020
Applicant:

Taiwan Semiconductor Manufacturing Company Ltd., Hsinchu, TW;

Inventors:

Ai-Jen Hung, Nantou County, TW;

Yung-Yao Lee, Hsinchu County, TW;

Heng-Hsin Liu, New Taipei, TW;

Chin-Chen Wang, Hsinchu, TW;

Ying Ying Wang, Hsinchu, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/00 (2006.01); G03F 9/00 (2006.01); H01L 21/68 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70633 (2013.01); G03F 7/70775 (2013.01); G03F 7/70783 (2013.01); G03F 9/7003 (2013.01); G03F 9/7046 (2013.01); G03F 9/7073 (2013.01); G03F 9/7088 (2013.01); H01L 21/682 (2013.01);
Abstract

A method includes receiving a wafer, measuring a surface topography of the wafer; calculating a topographical variation based on the surface topography measurement performing a single-zone alignment compensation when the topographical variation is less than a predetermined value or performing a multi-zone alignment compensation when the topographical variation is greater than the predetermined value; and performing a wafer alignment according to the single-zone alignment compensation or the multi-zone alignment compensation.


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