Ying-Hsing Chen

Title: Innovations of Ying-Hsing Chen

Introduction

Ying-Hsing Chen is a prominent inventor based in Taichung, Taiwan. He has made significant contributions to the field of substrate technology, holding a total of 7 patents. His work focuses on methods for fabricating substrates with high reflectance, which have applications in various electronic devices.

Latest Patents

Ying-Hsing Chen's latest patents include a method of fabricating a substrate with a metal reflection layer. This innovative process involves forming a first and second patterned circuit layer on a base material. A first adhesive layer is applied to the first patterned circuit layer, while a metal reflection layer is designed to cover the first insulation layer, achieving a reflectance of 85% or greater. Additionally, a transparent adhesive layer and a protection layer made of transparent polymer are included, ensuring a light transmittance of at least 80%. Another notable patent is the method for manufacturing a substrate structure with high reflectance, which also emphasizes the importance of the metal reflection layer and its substantial reflectance properties.

Career Highlights

Ying-Hsing Chen is currently employed at Uniflex Technology Inc., where he continues to innovate and develop new technologies. His expertise in substrate fabrication has positioned him as a key player in the industry, contributing to advancements that enhance the performance of electronic components.

Collaborations

Ying-Hsing Chen has collaborated with talented coworkers such as Yi-Chun Liu and Yuan-Chih Lee. Their combined efforts have led to the successful development of innovative technologies in substrate manufacturing.

Conclusion

Ying-Hsing Chen's contributions to substrate technology through his patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in electronic device performance and efficiency.