The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 28, 2020

Filed:

Apr. 18, 2019
Applicant:

Uniflex Technology Inc., Taichung, TW;

Inventors:

Cheng-I Tu, Tainan, TW;

Ying-Hsing Chen, Taichung, TW;

Meng-Huan Chia, Taichung, TW;

Hsin-Ching Su, Miaoli County, TW;

Yi-Chun Liu, New Taipei, TW;

Cheng-Chung Lai, Changhua County, TW;

Yuan-Chih Lee, Taoyuan, TW;

Assignee:

UNIFLEX Technology Inc., Taichung, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05K 1/02 (2006.01); H05K 1/11 (2006.01); H05K 3/46 (2006.01); H05K 3/28 (2006.01);
U.S. Cl.
CPC ...
H05K 1/0274 (2013.01); H05K 1/115 (2013.01); H05K 3/28 (2013.01); H05K 3/46 (2013.01); H05K 2201/10106 (2013.01); H05K 2201/2054 (2013.01);
Abstract

A substrate structure with high reflectance includes a base material, a patterned circuit layer, an insulating layer and a metal reflecting layer. The base material includes a first surface and a second surface opposite to the first surface. The patterned circuit layer is disposed on the first surface. The insulating layer covers the patterned circuit layer and a part of the first surface exposed by the patterned circuit layer. The metal reflecting layer covers the insulating layer, and a reflectance of the metal reflecting layer is substantially greater than or equal to 85%. A manufacturing method of a substrate structure with high reflectance is also provided.


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