Yi-Ying Liu

Title: Yi-Ying Liu: Pioneering Innovator in Semiconductor Technology

Introduction:

Yi-Ying Liu, a distinguished inventor based in Hsinchu, TW, is renowned for his unwavering commitment to innovation and his profound impact on the field of semiconductor technology. With a remarkable portfolio of 11 patents, Liu's groundbreaking work continues to pave the way for advancements in the realm of technology and inspire the next generation of inventors.

Latest Patents:

1. Method of forming conductive feature including cleaning step: Liu's method involves forming a semiconductor device by leaving seeds on the sidewalls of an opening through a dielectric layer, treating these seeds to form treated seeds, and subsequently removing them through a cleaning process, which includes a rinse with deionized water. This process facilitates the formation of a second conductive feature to fill the opening.

2. Hybrid conductive structures: Liu's innovative method focuses on forming metallization layers comprising a ruthenium metal liner and a cobalt metal fill. By depositing ruthenium metal on the bottom and sidewall surfaces of an opening, followed by the deposition of cobalt metal to fill the opening, Liu's method produces S/D conductive structures with a top surface coplanar with the first dielectric's top surface.

Career Highlights:

Yi-Ying Liu is a distinguished member of the Taiwan Semiconductor Manufacturing Company Limited (TSMC), where he channels his passion for innovation into groundbreaking research and development initiatives. His expertise and leadership in semiconductor technology have significantly contributed to TSMC's position as a trailblazer in the industry.

Collaborations:

Liu's collaborative spirit is evident in his close working relationships with accomplished colleagues such as Cheng-Wei Chang and Chia-Hung Chu. Together, they have synergized their talents and expertise to drive forward innovative projects and achieve remarkable technological breakthroughs.

Conclusion:

Yi-Ying Liu's exceptional dedication to innovation, coupled with his pioneering spirit and collaborative approach, underscores his pivotal role in shaping the future of semiconductor technology. His profound impact on the field serves as a testament to his relentless pursuit of excellence and his enduring legacy as an inspiring figure in the world of inventions and patents.